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NuFlare Orders Zeiss Mask Metrology Tool

Carl Zeiss SMT disclosed one of the first orders for its next-generation mask metrology system from NuFlare Technology Inc. Developed by Zeiss with support from Sematech, the PROVE metrology system is considered a key building block for masks used in both 193 nm double patterning and EUV lithography.

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    After a November expression of interest got the cold shoulder, IP provider Virage Logic today announced that it has sent the board of directors of LogicVision a formal offer to acquire the company's outstanding stock for $1.05 per share, or about $10 million.

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